Multiscale Modeling of Chemical Vapor Deposition (CVD) Apparatus: Simulations and Approximations

Author: Geiser Juergen  

Publisher: MDPI

E-ISSN: 2073-4360|5|1|142-160

ISSN: 2073-4360

Source: Polymers, Vol.5, Iss.1, 2013-02, pp. : 142-160

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Abstract