In Situ Hall Effect Monitoring of Vacuum Annealing of In₂O₃:H Thin Films

Author： Wardenga Hans F. Frischbier Mareike V. Morales-Masis Monica Klein Andreas

Publisher： MDPI

E-ISSN： 1996-1944|8|2|561-574

ISSN： 1996-1944

Source： Materials, Vol.8, Iss.2, 2015-02, pp. : 561-574

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