Author: Chen Meixi Hack James H. Lin Xi Janotti Anderson Opila Robert L.
Publisher: MDPI
E-ISSN: 2079-6412|8|3|108-108
ISSN: 2079-6412
Source: Coatings, Vol.8, Iss.3, 2018-03, pp. : 108-108
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Photoelectrochemical dissolution of N-type silicon
Electrochimica Acta, Vol. 43, Iss. 16, 1998-05 ,pp. :
Nickel deposition behavior on n-type silicon wafer for fabrication of minute nickel dots
By Takano N. Niwa D. Yamada T. Osaka T.
Electrochimica Acta, Vol. 45, Iss. 20, 2000-06 ,pp. :