ICP-RIE etching of polar, semi-polar and non-polar AlN: comparison of Cl2/Ar and Cl2/BCl3/Ar plasma chemistry and surface pretreatment

Publisher： IOP Publishing

E-ISSN： 1361-6641|30|1|15021-15026

ISSN： 0268-1242

Source： Semiconductor Science and Technology, Vol.30, Iss.1, 2015-01, pp. : 15021-15026

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Non-polar and semi-polar ammonothermal GaN substrates

By Kucharski R   Zając M   Doradziński R   Rudziński M   Kudrawiec R   Dwiliński R  

Semiconductor Science and Technology, Vol. 27, Iss. 2, 2012-02 ,pp. : 24007-24021

IOP Publishing

Access to resources Recommend Favorite

Non-polar and semipolar nitride semiconductors

By Han Jung   Kneissl Michael  

Semiconductor Science and Technology, Vol. 27, Iss. 2, 2012-02 ,pp. : 20301-20302

IOP Publishing

Access to resources Recommend Favorite

Charge transport in non-polar and semi-polar III-V nitride heterostructures

By Konar Aniruddha   Verma Amit   Fang Tian   Zhao Pei   Jana Raj   Jena Debdeep  

Semiconductor Science and Technology, Vol. 27, Iss. 2, 2012-02 ,pp. : 24018-24034

IOP Publishing

Access to resources Recommend Favorite

Theory of non-polar and semi-polar nitride semiconductor quantum-well structures

By Ahn Doyeol   Park Seoung-Hwan  

Semiconductor Science and Technology, Vol. 27, Iss. 2, 2012-02 ,pp. : 24011-24019

IOP Publishing

Access to resources Recommend Favorite

Inductively coupled plasma etching of InGaP, AllnP, and AlGaP in Cl 2 and BCl 3 chemistries

By Hong J.   Lambers E.   Abernathy C.   Pearton S.   Shul R.   Hobson W.  

Journal of Electronic Materials, Vol. 27, Iss. 3, 1998-03 ,pp. : 132-137

Springer Publishing Company

Access to resources Recommend Favorite