Thin film germanium on silicon created via ion implantation and oxide trapping

Publisher: IOP Publishing

E-ISSN: 1742-6596|619|1|7-10

ISSN: 1742-6596

Source: Journal of Physics: Conference Series , Vol.619, Iss.1, 2015-06, pp. : 7-10

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract