Conditions for high yield of selective-area epitaxy InAs nanowires on SiOx/Si(111) substrates

Publisher: IOP Publishing

E-ISSN: 1361-6528|26|46|465301-465306

ISSN: 0957-4484

Source: Nanotechnology, Vol.26, Iss.46, 2015-11, pp. : 465301-465306

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