Nitric oxide assisted C60 secondary ion mass spectrometry for molecular depth profiling of polyelectrolyte multilayers

Publisher： John Wiley & Sons Inc

E-ISSN： 1097-0231|29|23|2204-2210

ISSN： 0951-4198

Source： RAPID COMMUNICATIONS IN MASS SPECTROMETRY, Vol.29, Iss.23, 2015-12, pp. : 2204-2210

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

High-resolution secondary ion mass spectrometry depth profiling of superconducting thin films

By Montgomery N.J.   MacManus-Driscoll J.L.   McPhail D.S.   Chater R.J.   Moeckly B.   Char K.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 237-240

Elsevier

Access to resources Recommend Favorite

Combined Secondary Ion Mass Spectrometry Depth Profiling and Focused Ion Beam Analysis of Cu Films Electrodeposited under Oscillatory Conditions

By  

CHEMELECTROCHEM (ELECTRONIC), Vol. 2, Iss. 5, 2015-05 ,pp. : 664-671

John Wiley & Sons Inc

Access to resources Recommend Favorite

Multilayer thin-film coatings based on chromium nitride and aluminum nitride: Comparative depth profiling by secondary ion mass spectrometry and glow-discharge optical emission spectrometry

By Tolstoguzov A.  

Journal of Analytical Chemistry, Vol. 65, Iss. 13, 2010-12 ,pp. : 1370-1376

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Analysis of aqueous nitric acid solutions using secondary-ion mass spectrometry

By Pronchev G.   Korobeinikova I.   Ermakov A.  

Journal of Analytical Chemistry, Vol. 65, Iss. 9, 2010-09 ,pp. : 940-944

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Inside Cover: Combined Secondary Ion Mass Spectrometry Depth Profiling and Focused Ion Beam Analysis of Cu Films Electrodeposited under Oscillatory Conditions (ChemElectroChem 5/2015)

By  

CHEMELECTROCHEM (ELECTRONIC), Vol. 2, Iss. 5, 2015-05 ,pp. : 618-618

John Wiley & Sons Inc

Access to resources Recommend Favorite