Resistive switching behavior of HfO2 film with different Ti doping concentrations

Author: Guo Tingting   Tan Tingting   Liu Zhengtang  

Publisher: IOP Publishing

E-ISSN: 1361-6463|49|4|45103-45108

ISSN: 0022-3727

Source: Journal of Physics D: Applied Physics, Vol.49, Iss.4, 2016-02, pp. : 45103-45108

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Abstract