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By Srivastava Sanjay K   Kumar Dinesh   Schmitt S W   Sood K N   Christiansen S H   Singh P K  

Nanotechnology, Vol. 25, Iss. 17, 2014-05 ,pp. : 175601-175617

IOP Publishing

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An in-house approach for fabrication of silicon nanowire arrays using electroless metal deposition and etching method

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International Journal of Surface Science and Engineering, Vol. 7, Iss. 3, 2013-09 ,pp. : 285-294

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Effect of AgNO 3 concentration on structure of aligned silicon nanowire arrays fabricated via silver-assisted chemical etching

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International Journal of Nanotechnology, Vol. 10, Iss. 3-4, 2013-04 ,pp. : 343-350

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Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers

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Journal of Micromechanics and Microengineering, Vol. 24, Iss. 12, 2014-12 ,pp. : 125026-125031

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Influence of the doping level on the porosity of silicon nanowires prepared by metal-assisted chemical etching

By Geyer Nadine   Wollschläger Nicole   Fuhrmann Bodo   Tonkikh Alexander   Berger Andreas   Werner Peter   Jungmann Marco   Krause-Rehberg Reinhard   Leipner Hartmut S  

Nanotechnology, Vol. 26, Iss. 24, 2015-06 ,pp. : 245301-245307

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