Heavy ion induced electrical property degradation in sub-100 nm bulk silicon MOS devices

Author: Yehua Chen   Xia An   Weikang Wu   Yao Zhang   Jingjing Liu   Xing Zhang   Ru Huang  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.36, Iss.11, 2015-11, pp. : 114002-114005

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