Influence of oxidant passivation on controlling dishing in alkaline chemical mechanical planarization

Author: Shaohua Jia   Yuling Liu   Chenwei Wang   Chenqi Yan  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.36, Iss.12, 2015-12, pp. : 126002-126005

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract