Publisher: Edp Sciences
E-ISSN: 1764-7177|02|C2|C2-907-C2-913
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.02, Iss.C2, 1991-09, pp. : C2-907-C2-913
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Deposition of tungsten by plasma enhanced chemical vapour deposition
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
Point and extended defects in chemical vapour deposited diamond
Journal of Physics: Conference Series , Vol. 281, Iss. 1, 2011-02 ,pp. :
Chemical Vapour Deposition for Optical Fibre Technology
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :
Chemical vapour deposition of nitride and oxynitride dielectric films
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :