Study of the growth mechanisms of low-pressure chemically vapour deposited silica films

Publisher： Edp Sciences

E-ISSN： 1764-7177|09|PR8|Pr8-265-Pr8-271

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.09, Iss.PR8, 1999-09, pp. : Pr8-265-Pr8-271

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