Leakage conduction mechanism of amorphous $\chem{Lu_{2}O_{3}}$ high-$\mth{k}$ dielectric films fabricated by pulsed laser ablation

Publisher： Edp Sciences

E-ISSN： 1286-4854|77|6|67001-67001

ISSN： 0295-5075

Source： EPL (EUROPHYSICS LETTERS), Vol.77, Iss.6, 2007-03, pp. : 67001-67001

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