Encapsulation of Homogeneous Catalysts in Mesoporous Materials Using Diffusion‐Limited Atomic Layer Deposition

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-3773|57|4|1091-1095

ISSN： 1433-7851

Source： ANGEWANDTE CHEMIE INTERNATIONAL EDITION, Vol.57, Iss.4, 2018-01, pp. : 1091-1095

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Encapsulation of Homogeneous Catalysts in Mesoporous Materials Using Diffusion‐Limited Atomic Layer Deposition

By  

ANGEWANDTE CHEMIE, Vol. 130, Iss. 4, 2018-01 ,pp. : 1103-1107

John Wiley & Sons Inc

Access to resources Recommend Favorite

Complex Materials by Atomic Layer Deposition

By  

ADVANCED MATERIALS, Vol. 27, Iss. 38, 2015-10 ,pp. : 5778-5784

John Wiley & Sons Inc

Access to resources Recommend Favorite

Complex Materials by Atomic Layer Deposition

By  

ADVANCED MATERIALS, Vol. 935-9648, Iss. 38, 2015-10 ,pp. : 5778-5784

John Wiley & Sons Inc

Access to resources Recommend Favorite

Nanoscale Structuring of Surfaces by Using Atomic Layer Deposition

By  

ANGEWANDTE CHEMIE INTERNATIONAL EDITION, Vol. 54, Iss. 50, 2015-12 ,pp. : 15014-15021

John Wiley & Sons Inc

Access to resources Recommend Favorite

Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications

By  

ADVANCED MATERIALS, Vol. 24, Iss. 8, 2012-02 ,pp. : 1017-1032

John Wiley & Sons Inc

Access to resources Recommend Favorite