Influence of O 2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET substrate using RF reactive magnetron sputtering

Author： Kim Y.-S.   Park Y.-C.   Ansari S.G.   Lee J.-Y.   Lee B.-S.   Shin H.-S.  

Publisher： Elsevier

ISSN： 0257-8972

Source： Surface and Coatings Technology, Vol.173, Iss.2, 2003-08, pp. : 299-308

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