Related content

Electrochemical behavior of the Ti-6Al-4V alloy coated with a-C:H films

By Oliveira M.A.S.   Vieira A.K.   Massi M.  

Diamond and Related Materials, Vol. 12, Iss. 12, 2003-12 ,pp. : 2136-2146

Elsevier

Access to resources Recommend Favorite

Charge-based deep level transient spectroscopy of undoped and nitrogen-doped ultrananocrystalline diamond films

By Polyakov V.I.   Rukovishnikov A.I.   Rossukanyi N.M.   Pereverzev V.G.   Pimenov S.M.   Carlisle J.A.   Gruen D.M.   Loubnin E.N.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 1776-1782

Elsevier

Access to resources Recommend Favorite

Helium effusion measurements for studying the microstructure of a-SiC:H films deposited by d.c. sputtering

By Saleh R.   Munisa L.   Beyer W.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 1927-1931

Elsevier

Access to resources Recommend Favorite

Hard amorphous carbon-fluorine films deposited by PECVD using C 2 H 2 -CF 4 gas mixtures as precursor atmospheres

By Jacobsohn L.G.   Maia da Costa M.E.H.   Trava-Airoldi V.J.   Freire F.L.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 2037-2041

Elsevier

Access to resources Recommend Favorite

The characterization of nanocrystal graphite films deposited by ECR plasma sputtering

By Ohana T.   Nakamura T.   Goto A.   Tsugawa K.   Tanaka A.   Koga Y.  

Diamond and Related Materials, Vol. 12, Iss. 10, 2003-10 ,pp. : 2011-2015

Elsevier

Access to resources Recommend Favorite