Etching of low- k materials for microelectronics applications by means of a N 2 /H 2 plasma: modeling and experimental investigation

Author： Van Laer K.   Tinck S.   Samara V.   de Marneffe J.F.   Bogaerts A.  

Publisher： IOP Publishing

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.22, Iss.2, 2013-04, pp. : 25011-25029

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