Effects of O 2 /Ar ratio and annealing temperature on electrical properties of Ta 2 O 5 film prepared by magnetron sputtering

Author: Shi-Hua Huang   Pei-Hong Cheng   Yong-Yue Chen  

Publisher: IOP Publishing

ISSN: 1674-1056

Source: Chinese Physics B, Vol.22, Iss.2, 2013-02, pp. : 27701-27706

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Abstract