Roughening kinetics of reactively sputter-deposited Ti-Al-N films on Si(100)

Author: Liu Z.-J.   Shum P.W.   Li K.Y.   Shen Y.G.  

Publisher: Taylor & Francis Ltd

ISSN: 1362-3036

Source: Philosophical Magazine Letters, Vol.83, Iss.10, 2003-10, pp. : 627-634

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Abstract