Interfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrier

ISSN： 1478-6443

Source： Philosophical Magazine, Vol.84, Iss.12, 2004-04, pp. : 1209-1218

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Interfacial microstructures of rf-sputtered TiNi shape memory alloy thin films on (100) silicon

By Wu S.K. Chen J.Z. Wu Y.J. Wang J.Y. Yu M.N. Chen F.R. Kai J.J.

Philosophical Magazine. A. Physics of Condensed Matter. Defects and Mechanical Properties, Vol. 81, Iss. 8, 2001-08 ,pp. : 1939-1949

Taylor & Francis Ltd

Access to resources Recommend Favorite

Crystallization behavior of r.f.-sputtered TiNi thin films

By Chen J.Z. Wu S.K.

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 194-199

Elsevier

Access to resources Recommend Favorite

Conductivity of r.f.-sputtered Ni 100-x - Si x thin films with 33=

By Belu-Marian A. Serbanescu M.D. Manaila R. Malis O. Devenyi A. Ivanov E.

Thin Solid Films, Vol. 259, Iss. 1, 1995-04 ,pp. : 105-112

Elsevier

Access to resources Recommend Favorite

Amorphous r.f.-sputtered Si 100-x Ni x thin films with 0=

By Belu-Marian A. Serbanescu M.D. Manaila R. Stoica T. Dragomir A. Zavaliche F. Tanase M. Devenyi A.

Thin Solid Films, Vol. 301, Iss. 1, 1997-06 ,pp. : 197-202

Elsevier

Access to resources Recommend Favorite

Dielectric properties of RF-sputtered silicon nitride thin films with gold electrodes

By Gould R.D. Awan S.A.

Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. : 309-314

Elsevier

Access to resources Recommend Favorite