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Author: Giallonardo J.D.
Publisher: Taylor & Francis Ltd
ISSN: 1478-6443
Source: Philosophical Magazine, Vol.91, Iss.36, 2011-12, pp. : 4594-4605
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
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Tantalum plasma etching with minimum effect on underlying nickel-iron thin film
By Hsiao R. Miller D. Lin T. Robertson N.
Thin Solid Films, Vol. 304, Iss. 1, 1997-07 ,pp. :