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Russian Chemical Bulletin, Vol. 51, Iss. 3, 2002-03 ,pp. : 544-546

Springer Publishing Company

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Profile of Al etch rate estimated from the analysis of 3-D rarefied flow of Cl 2 , BCl 3 , and AlCl 3 in a commercial etcher

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Chemical vapour deposition of polycrystalline AlN films from AlCl 3 -NH 3 mixtures. - Analysis and modelling of transport phenomena

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Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 1-16

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Assessment of Gaussian-3X theory for chlorinated organic molecules. Enthalpies of formation of chlorobenzenes and predictions for polychlorinated aromatic compounds

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Cyclophanes or Cyclodextrins: What is the Best Host for Aromatic Volatile Organic Compounds?

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