Author: Dworschak W. Jung K. Ehrhardt H.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.254, Iss.1, 1995-01, pp. : 65-74
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
The growth of cubic boron nitride films by RF reactive sputter
By Deng J. Wang B. Tan L. Yan H. Chen G.
Thin Solid Films, Vol. 368, Iss. 2, 2000-06 ,pp. :
Roughness and deposition mechanism of DLC films prepared by r.f. plasma glow discharge
By Ali A. Hirakuri K.K. Friedbacher G.
Vacuum, Vol. 51, Iss. 3, 1998-11 ,pp. :
By Chattopadhyay K.K. Matsumoto S. Zhang Y.-F. Sakaguchi I. Nishitani-Gamo M. Ando T.
Thin Solid Films, Vol. 354, Iss. 1, 1999-10 ,pp. :
On the influence of substrate temperature for cubic boron nitride growth
Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. :
Parameter spaces for the nucleation and the subsequent growth of cubic boron nitride films
Thin Solid Films, Vol. 423, Iss. 2, 2003-01 ,pp. :