Influence of the oxidation process on the luminescence of HF-treated porous silicon

Author: Dittrich T.   Flietner H.   Timoshenko V.Y.   Kashkarov P.K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.255, Iss.1, 1995-01, pp. : 149-151

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Abstract