Author: Engqvist J. Jansson U.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.263, Iss.1, 1995-07, pp. : 54-64
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Different stages during CVD deposition on porous substrates
By Alonso F. Gomez-Aleixandre C. Albella J.M. Mart F.J.
Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. :
Initial stages of ultra thin Ti film growth on Si(111)-7x7 surface
By Hsu H.F. Lu M.C. Fang C.K. Chen L.J. Hsiao H.L. Pi T.W.
Thin Solid Films, Vol. 428, Iss. 1, 2003-03 ,pp. :
CoSi 2 and TiSi 2 for Si/SiGe heterodevices
By Gluck M. Schuppen A. Rosler M. Heinrich W. Hersener J. Konig U. Yam O. Eizenberg M. Cytermann C.
Thin Solid Films, Vol. 270, Iss. 1, 1995-12 ,pp. :
Morphological stability of TiSi 2 on polycrystalline silicon
Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. :