Author: Gluck M. Schuppen A. Rosler M. Heinrich W. Hersener J. Konig U. Yam O. Eizenberg M. Cytermann C.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 549-554
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Comparison of epitaxial growth of CoSi 2 among Co/Ti, Co/Hf, and Co/Nb bilayers on (100)Si
Thin Solid Films, Vol. 380, Iss. 1, 2000-12 ,pp. :
Self-ordering of CoSi 2 precipitates and epitaxial layer growth of CoSi 2 on Si(100)
By Mantl S. Hacke M. Bay H.L. Kappius L. Mesters S.
Thin Solid Films, Vol. 321, Iss. 1, 1998-05 ,pp. :
Morphological stability of TiSi 2 on polycrystalline silicon
Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. :