Effect of reactant depletion on the microstructure and preferred orientation of polycrystalline SiC films by chemical vapor deposition

Author： Kim D.-J.   Choi D.-J.   Kim Y.-W.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.266, Iss.2, 1995-10, pp. : 192-197

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