Tensilely-stressed SiN films reactively sputtKrN 2 plasmas for producing free-standing devices

Author: Sugimoto I.   Kuwano H.   Nakano S.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.268, Iss.1, 1995-11, pp. : 152-160

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Abstract