Effect of the hydrogen partial pressure ratio on the properties of c-Si:H films prepared by rf magnetron sputtering

By Makihara H.   Tabata A.   Suzuoki Y.   Mizutani T.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 785-791

Elsevier

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The influence of the momentum transfer on the structural and optical properties of ZnSe thin films prepared by r.f. magnetron sputtering

By Rizzo A.   Tagliente M.A.   Caneve L.   Scaglione S.  

Thin Solid Films, Vol. 368, Iss. 1, 2000-06 ,pp. : 8-14

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D.c. properties of ZnO thin films prepared by r.f. magnetron sputtering

By Mahmood F.S.   Gould R.D.   Hassan A.K.   Salih H.M.  

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Electrical properties of Ge-Au films prepared by magnetron sputtering

By Berlicki T.M.   Prociow E.L.   Beensh-Marchwicka G.   Osadnik S.J.  

Vacuum, Vol. 65, Iss. 1, 2002-02 ,pp. : 73-79

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Influence of post-deposition annealing on the properties of transparent conductive nanocrystalline ZAO thin films prepared by RF magnetron sputtering with highly conductive ceramic target

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