High pressure sintering behavior and mechanical properties of cBN–Ti₃Al and cBN–Ti₃Al-Al composite materials

By Li Yu   Kou Zili   Wang Haikuo   Wang Kaixue   Tang Hongchang   Wang Yanfei   Liu Shenzhuo   Ren Xiangting   Meng Chuanming   Wang Zhigang  

International Journal of High Pressure Research, Vol. 32, Iss. 4, 2012-12 ,pp. : 524-531

Taylor & Francis Ltd

Access to resources Recommend Favorite

Modeling of reactively sputtered TiAlN films

By Lii D.-F.   Huang J.-L.   Shew B.-Y.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 122-126

Elsevier

Access to resources Recommend Favorite

Reactively magnetron sputtered Ti-Al-N thin films with enhanced mechanical properties

By Kourtev J.   Pascova R.  

Vacuum, Vol. 47, Iss. 10, 1996-10 ,pp. : 1197-1201

Elsevier

Access to resources Recommend Favorite

Microstructural and Mechanical Properties of TiAlN and Ti₃AlN Films Deposited by Reactive Magnetron Sputtering

By  

Materials Science Forum, Vol. 2015, Iss. 816, 2015-05 ,pp. : 283-288

Trans Tech Publications

Access to resources Recommend Favorite

Microstructures and Reaction Properties of Ti/Ni, Ti/Al and Ni/Al Multilayer Films

By  

Journal of Nano Research, Vol. 2018, Iss. 54, 2018-10 ,pp. : 22-34

Trans Tech Publications

Access to resources Recommend Favorite