Author： Yeh W.-K. Chen M.-C. Wang P.-J. Liu L.-M. Lin M.-S.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 462-466
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
A detailed model for low-pressure CVD of tungsten
By Kleijn C.R. Kuijlaars K.J. Van den Akker H.E.A.
Thin Solid Films, Vol. 270, Iss. 1, 1995-12 ,pp. :
Access to resources
Recommend
Precursor design and selective aluminum CVD
Vacuum, Vol. 46, Iss. 11, 1995-11 ,pp. :
Tungsten‐Based Catalysts for Selective Deoxygenation
ANGEWANDTE CHEMIE INTERNATIONAL EDITION, Vol. 52, Iss. 19, 2013-05 ,pp. :
Tungsten‐Based Catalysts for Selective Deoxygenation
ANGEWANDTE CHEMIE, Vol. 125, Iss. 19, 2013-05 ,pp. :