Metal-organic chemical vapor deposition of tantalum nitride barrier layers for ULSI applications

Author: Tsai M.H.   Sun S.C.   Lee C.P.   Chiu H.T.   Tsai C.E.   Chuang S.H.   Wu S.C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 531-536

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Abstract