Morphology and stability of (Ti 0.9 Zr 0.1 )Si 2 thin films on Si(111) and Si(100) formed in UHV

Author： Doa Y.   Sayers D.E.   Nemanich R.J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 544-548

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