![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Breeman M. Langelaar M.H. Boerma D.O. Barkema G.T.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.272, Iss.2, 1996-01, pp. : 195-207
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Computer simulation of metal thin-film epitaxy
Thin Solid Films, Vol. 272, Iss. 2, 1996-01 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Computer simulation of semicontinuous and continuous metal film morphology
By Hrach R. Novotny D. Novak S. Pavlik J.
Vacuum, Vol. 50, Iss. 3, 1998-07 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Computer simulation of emission of neutrals from liquid metal ion source
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :