Reactive ion etching of vapor phase deposited polyimide films in CF 4 /O 2 : Effect on surface morphology

Author: Popova K.   Spassova E.   Zhivkov I.   Danev G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.274, Iss.1, 1996-03, pp. : 31-34

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Abstract