Deposition of PZT films by MOCVD at low temperature and their change in properties with annealing temperature and Zr/Ti ratio

Author: Kim H.-G.   Kim Y.-M.   Lee W.-J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.279, Iss.1, 1996-06, pp. : 140-144

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Abstract