Electrical passivation of B-doped Si through thin films used in VLSI fabrication

Author: Tsukamoto K.   Iwasaki S.   Sadoh T.   Kuroki Y.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.286, Iss.1, 1996-09, pp. : 299-304

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Abstract