Observation of post-deposition resistance relaxation during growth of semicontinuous metal films

Author: Yin D.   Wu J.   Wang Z.   Wu K.   Zhang J.   Li C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.295, Iss.1, 1997-02, pp. : 315-319

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Abstract