Comparison of Al/SiN/a-Si:H and Al/SiO 2 /a-Si:H top gate structures under thermal bias stresses

Author: Dayoub F.   Kleider J.P.   Mencaraglia D.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 137-140

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Abstract