Optical properties of polycrystalline silicon thin films deposited by single-wafer chemical vapor deposition

Author: Marazzi M.   Giardini M.E.   Borghesi A.   Sassella A.   Alessandri M.   Ferroni G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 91-93

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content