Tantalum plasma etching with minimum effect on underlying nickel-iron thin film

Author: Hsiao R.   Miller D.   Lin T.   Robertson N.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.304, Iss.1, 1997-07, pp. : 381-385

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract