Effects of deposition parameters on composition, structure, resistivity and step coverage of TiN thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Author： Kim J.-S.   Lee E.-J.   Baek J.-T.   Lee W.-J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.305, Iss.1, 1997-08, pp. : 103-109

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