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Vacuum, Vol. 52, Iss. 1, 1999-01 ,pp. : 55-60

Elsevier

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AlN thin films prepared by ion beam induced chemical vapour deposition

By Sanchez-Lopez J.C.   Contreras L.   Fernandez A.   Gonzalez-Elipe A.R.   Martin J.M.   Vacher B.  

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Electron beam induced damage in N-rich SiN x films deposited by plasma enhanced chemical vapour deposition

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Deposition, structure evolution and dielectric properties of BaTiO 3 and Ba x Sr 1-x TiO 3 thin films prepared by the sol-gel method

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Raman scattering studies of amorphous Si x Ge 1 - x :H alloy films produced by hot-filament assisted chemical vapour deposition technique

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