Ar stabilisation of the cubic/tetragonal phases of ZrO 2 in thin films prepared by ion beam induced chemical vapour deposition

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Stress generation during ion beam-assisted pulsed laser deposition of thin AlN films

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Electron microscopy analysis of the microstructure of Ti 1-x Al x N alloy thin films prepared using a chemical vapour deposition method

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Thin Solid Films, Vol. 315, Iss. 1, 1998-03 ,pp. : 257-262

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Study on the crystallization of nickel films prepared by the ion beam and vapour deposition method

By Murakami Y.   Kuratani N.   Imai O.   Ogata K.  

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Electron beam induced damage in N-rich SiN x films deposited by plasma enhanced chemical vapour deposition

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