Author: Villalvilla J.M. Crespo J. Quintana J.A. Santos C. Valles-Abarca J.A.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.317, Iss.1, 1998-04, pp. : 340-342
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Diffraction gratings in dry developed dichromated gelatin films
By Quintana J.A. Boj P.G. Crespo J. Valles-Abarca J.A. Villalvilla J.M.
Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. :
Etching of RuO 2 and Pt thin films with ECR/RF reactor
By Baborowski J. Muralt P. Ledermann N. Hiboux S.
Vacuum, Vol. 56, Iss. 1, 2000-01 ,pp. :
ECR-plasma parameters and properties of thin DLC films
By Inaba H. Fujimaki S. Furusawa K. Todoroki S.
Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. :
Etching action by atomic hydrogen and low temperature silicon epitaxial growth on ECR plasma CVD
By Sasaki K. Tomoda H. Takada T.
Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. :