Observation of spectral and normal emissivity as a method of surface control during the growth of diamond films deposited by a microwave plasma-assisted CVD technique

By Pigeat P.   Barrat S.   Dieguez I.   Bauer-Grosse E.   Weber B.  

Thin Solid Films, Vol. 263, Iss. 2, 1995-07 ,pp. : 127-133

Elsevier

Access to resources Recommend Favorite

Aerosol‐Assisted CVD of Bismuth Vanadate Thin Films and Their Photoelectrochemical Properties

By  

CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol. 21, Iss. 1-2-3, 2015-03 ,pp. : 41-45

John Wiley & Sons Inc

Access to resources Recommend Favorite

Preparation and characterisation of Co(II) ion-doped poly vinyl alcohol-assisted ZnSe nano particles

By Ram N. Sree  

Journal of Experimental Nanoscience, Vol. 8, Iss. 3, 2013-04 ,pp. : 254-260

Taylor & Francis Ltd

Access to resources Recommend Favorite

Epitaxial growth with phosphorus - 4. Application of dichloro-t-butylphosphine to CVD processes: the thermal chemical vapor deposition formation of copper phosphide thin films and etching of indium phosphide by dichloro-t-butylphosphine [1]

By Glass J.A.   Spencer J.T.  

Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 138-142

Elsevier

Access to resources Recommend Favorite

Growth mechanisms and structural properties of microcrystalline silicon films deposited by catalytic CVD

By Niikura C.   Kim S.Y.   Drevillon B.   Poissant Y.   Roca i Cabarrocas P.   Bouree J.E.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 178-183

Elsevier

Access to resources Recommend Favorite