Growth mechanisms and structural properties of microcrystalline silicon films deposited by catalytic CVD

Author： Niikura C.   Kim S.Y.   Drevillon B.   Poissant Y.   Roca i Cabarrocas P.   Bouree J.E.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 178-183

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