Optimized processing for differentially molecular beam epitaxy-grown SiGe(C) devices

Author: Lippert G.   Osten H.J.   Blum K.   Sorge R.   Schley P.   Kruger D.   Fischer G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.321, Iss.1, 1998-05, pp. : 21-25

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Abstract