XPS and AFM study of chemical mechanical polishing of silicon nitride

Author: Yang G.-R.   Zhao Y.-P.   Hu Y.Z.   Paul Chow T.   Gutmann R.J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.333, Iss.1, 1998-11, pp. : 219-223

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Abstract